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| RMSC series |
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| Introduction |
| In recent years, Solar Cell installations have gone beyond commercial development and have begun |
| to expand into residential areas to meet the needs of this ever expanding product development, |
| InVacuo, Inc. has introduced a full scale Cluster Tool to meet the complex needs of Solar Cell |
| Research & Development which can also be geared toward large area production scale up. |
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| Features |
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| - Stainless Steel Chamber providing an ultimate base pressure below 2X10-8 |
| - Fully bakeable All-Metal-Seals in main process chamber |
| - Deposition uniformity better than ±5% across a 100mm x100mm |
| - Etching uniformity better than ±5% over a 100mm x 100mm substrate |
| - Substrate heating uniformity better than ±2% |
| Specifications |
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| 1. Loading chamber |
| Loadlock isolation with thermal heating capability |
| Molded type pipe heater with temperature capability up to 500°C |
| Z-motion transport system with ±80mm travel sample manipulation |
| Magnetic Bar transfer system to transport samples into process chambers |
TMP Processing |
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| 2. Sputtering chamber |
| 8”Dia. magnetically enhanced cathode assembly |
| Molded type pipe heater with temperature capability up to 500°C |
| Z-motion transport system with ±35mm travel sample manipulation |
TMP Processing |
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| 3. P, I, I, N – Layer deposition chamber (PECVD system, 4 Sets) |
3-layer process gas mixing nozzle with rf bias
Molded type pipe heater with temperature electrical capability up to 500°C
Z-motion transport system with ±35mm travel sample manipulation
TMP Processing |
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| 4. Al/Ag deposition chamber (Thermal Evaporator system) |
| Sample manipulation capability |
| Continuous evaporation material feed capability for both Al and Ag |
| 1”dia. electrical feedthrough for thermal heaters |
| Automated thickness control monitor |
TMP Processing |
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| 5. a-Si etching chamber (ICP System) |
| 300mm Dia. by 20mm thick quartz substrate holder |
| RF powered plasma source with spiral coiled tuning network |
| Substrate cooling with rf bias |
| Z-motion transport system with ±35mm travel sample manipulation |
TMP Processing |
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| 6. ZnO deposition chamber : MOCVD System |
| 3-layer process gas mixing nozzle with individual flow gas control |
| Molded type pipe heater with temperature capability up to 500°C |
| Z-motion transport system with ±35mm travel sample manipulation |
| Rotary vane process pump with TMP control |
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| 7. Main cluster chamber |
| Sample manipulation to each outbound chamber via.a robotic carrier |
| Rotary vane pump combined with a Turbo Molecular Pump |
| Basic System Components |
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| Stainless Steel Construction High Vacuum Chambers |
| Rotary Vane Mechanical Pump and Turbo Molecular Pump |
| Isolation Valves are Gate Valve and Right Angle Poppet Valve |
| Substrate is 100mm x 100mm Glass Plate |
| Process Sequence |
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| Advantagse |
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| 1. Pumping Capability with Rotary Vane Pump and Turbo Molecular Pump |
| 2. Ease of Maintenance (Internal Shields to Prevent Stray Material Buildup) |
| 3. Excellent Thin Film Adhesion and Uniformity |
| 4. Continuous In situ Processing of Each Process Layer in One Pump Down |
| Applications |
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| Research and Development or Production of Solar Cell Devices |
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