 |
| RME series |
 |
| Feature |
| - Higher degree of efficiency in deposition |
| - Improvement in hardness and scratch resistance |
| - Enhanced uniformity |
| - No need for glow discharge or additional heating |
| - Decrease in thermal loading during progress |
| - Usage of various gases |
|
| Ultimate pressure |
Less than 2x10-7 Torr |
| Sample Size |
4” to 8” |
| Substrate size |
4” to 8” |
| Uniformity |
Within ±3% |
| System constitution |
deposition chamber |
| Substrate heater |
Maximum 800°C |
|
| Technical Description |
| |
| The ITO thin films deposited can be applied to the low temperature substrates |
| such as Vinyl and polycarbonate, which are required for the next generation display |
| devices, since these substrates are quite lighter than conventional glass substrates. |
|
| |
|
