 |
|
| RME series |
|
RME-E2000 series |
RME-E2000L series |
Feature
- High vacuum compatible to 10E-7 Torr
- Mechanical dry pump and Cryogenic
high vacuum pump
- High deposition rate
- High precision deposition rate control
- Multi-layer deposition
- Prevention of source-oxidation and sample
contamination because the process chamber
is always maintained under high vacuum conditions
to facilitate quick cycle times. |
Specification
| Model |
RME-E2000L Series |
RME-E2000 Series |
| Process Chamber |
Material : sus 304 |
| Chamber wall electro-polishing |
| Pumping Station |
Rotary pump & Tubor molecular pump or |
| Cryogenic pump |
| Evaporation Source |
Electron beam & Power supply |
| (Telemark Brand) |
| Substrate Type |
Rotation (Standard) |
| Deposition Control |
6MHz QCM cotroller |
6MHz QCM Monitor |
| (Controller Option) |
| Procss Control |
PLC based PC control |
PLC touch panel |
| (Labview software) |
(Semi-Auto) |
|
Optional Substrate Carriers
1. Hemispherical Dome
- Single Planetary Dome : 42 pc's 2" dia. wafers
- Three Planatary Domes : 108 pc's 2" dia. wafers
24 pc's 4" dia. wafers
2. Substrate Cooling
3. Substrate Heating
4. Planetary Substrate Carrier
(Revolving and Rotating)
|
